The continuous drive to offer
faster, smaller, and cheaper semiconductor ICs, requires advancements
in lithography, thermal treatments, and inspection in the wafer process
line to enable printing narrower gates, smaller line-width, shallower
S/D junctions, and a fail-safe inspection and metrology capability.
This challenging set of requirements
can only be realized through a paradigm shift to lower operating
wavelength, enabled and supported by the deployment of more efficient,
cost effective, and high-precision optics.
As manifested with the lithography technology, these ambitions will
continue in every aspect of the optically driven processing equipment
Based on field-proven high-precision
electroformed reflective optics capabilities, Media Lario Technologies
is uniquely positioned to effectively serve a wide range of thermally
demanding high-precision optics with an inherent cost advantage in
advanced lithography, thermal processing, as well as metrology and